| 摘要 |
<p>A desensitizing solution for lithographic platemaking which mainly comprises phytic acid or a salt thereof is disclosed, said desensitizing solution containing a polyether polyamine or a derivative thereof represented by formula (I): <CHEM> wherein k, m, x, and y each represent an integer of 1 or more; and R1 represents a hydrogen atom or CnH2nR2, wherein n is an integer of 1 or more, and R2 represents a hydrogen atom, an NR3R4 (wherein R3 and R4 each represent a hydrogen atom or an alkyl group), a chlorine atom, a fluorine atom, an iodine atom, a bromine atom, a hydroxyl group, a carboxyl group or a carbamoyl group, or a polyamine derivative represented by formula (II): <CHEM> wherein X represents a halogen atom; p and q each represent an integer of from 2 to 6; and r represents an integer of from 3 to 2000. The desensitizing solution exhibits satisfactory desensitizing characteristics without causing environmental pollution.</p> |
