| 摘要 |
The appts. comprises; a light source (1); a pair of polarisation plates (6a, 6b) between the light source (1) and a focusing lens (2), with the polarisation mask (3) between the focusing lens (2) and a min. Projection lens (4). The mask (3) only allows passage of the light with a required structure, the min. Projection lens (4) imaging this structure onto a wafer (5). The polarisation mask (3) has a Cr layer deposited on a quartz substrate and structured to form a Cr mask, prior to formation of two successive polarisation layers, each of which is etched, so that the two polarisation layers alternate. |
