发明名称 Process for metallized vias in polyimide
摘要 A process for producing a plurality of metallized vias in a polyimide dielectric is disclosed. The process includes depositing a polyimide precursor, then a silane and finally a metal, after patterning the polyimide and silane. The sandwich is heated to completely imidize the polyimide, crosslink the silane and anneal the metal simultaneously. The excess metal overlying the polyimide between the vias is removed by chemical mechanical polishing using the crosslinked silane as a polish stop.
申请公布号 US5397741(A) 申请公布日期 1995.03.14
申请号 US19930038407 申请日期 1993.03.29
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 O'CONNOR, LORETTA J.;PREVITI-KELLY, ROSEMARY A.;REEN, THOMAS J.
分类号 H01L21/28;H01L21/3205;H01L21/768;H01L23/52;H05K1/00;H05K1/03;H05K3/40;H05K3/46;(IPC1-7):H01L21/283 主分类号 H01L21/28
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