| 摘要 |
<p>PURPOSE:To provide a method for manufacturing a fluororesin resin thin film wherein the fluororesin thin film which is free from flaws, elongation, cut, etc., when peeled off in the air and free from sticking of foreign matters due to charging is obtained, and further a base material can be used again without treatments such as cleaning, polishing, etc. CONSTITUTION:A fluororesin thin film is formed on a glass base material preserved at 40-95% humidity. After drying, it is reserved again at 40-95% humidity. Thereafter, the fluororesin thin film is peeled off.</p> |
