发明名称 PARTICLES AND MANUFACTURE OF SEMICONDUCTOR DEVICE USING THEM
摘要 PURPOSE:To form an electrostatic transfer pattern which is uniform and whose pattern accuracy is high. CONSTITUTION:Particles which are constituted in such a way that a first fine- particle group 101 composed of a resin containing at least a partly unpolymerized part and a second fine-particle group 103 composed of an oxidative polymerization catalyst are bonded via a thermoplastic resin 102 are pattern-transferred to the surface of a substrate by an electrostatic transfer system, they are heated, the first and second fine-particle groups are brought into contact, a polymerization reaction is caused, and a desired pattern is formed.
申请公布号 JPH0766226(A) 申请公布日期 1995.03.10
申请号 JP19930209590 申请日期 1993.08.24
申请人 TOSHIBA CORP 发明人 IIDA ATSUKO
分类号 H01L21/52;H01L21/60;H05K3/20;(IPC1-7):H01L21/52 主分类号 H01L21/52
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