发明名称 METHOD FOR CLEANING SQUARE SUBSTRATE AFTER RUBBING TREATMENT AND DEVICE THEREFOR
摘要 PURPOSE:To prevent the generation of cleaning irregularity on the surface of a substrate, especially a large square substrate by bringing respective side-plates into contact with respective side surfaces facing each other of the square substrate before cleaning and moving the square substrate relatively to a flowing down position while making pure water flow down in a curtain shape on the surface of the square substrate over whole width direction thereof. CONSTITUTION:Pure water is supplied to a high pressure spray pipe 20 from a pure water tank 24 by driving a high pressure pump 26 and pure water is jetted on the surface of the square substrate W from nozzles of the high pressure spray pipe 20. The plural nozzles of the high pressure spray pipe 20 are provided in parallel in the direction orthogonal to a transportation direction of the square substrate W and the pure water 28 is allowed to flow down on the surface of the square substrate W in a curtain shape with a high pressure. In a pre-stage treatment room 10, sideplates 30 with slender plate shape which are brought into contact with a pair of side surfaces facing each other of the square substrate W to be transported by a transportation roller 18 are disposed on both sides and respective upper edges thereof are held at positions by several mm higher than upper surface of the square substrate W.
申请公布号 JPH0764091(A) 申请公布日期 1995.03.10
申请号 JP19930234128 申请日期 1993.08.24
申请人 DAINIPPON SCREEN MFG CO LTD 发明人 SUZUKI SATOSHI
分类号 G02F1/13;G02F1/1337;(IPC1-7):G02F1/133 主分类号 G02F1/13
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