| 摘要 |
<p>PURPOSE:To allow cleaning in a substrate treating section even for a structure where a substrate is vacuum sucked. CONSTITUTION:The treating liquid coater 1 for coating the surface of a rectangular substrate W with photoresist liquid comprises a substrate treating section including an upper rotary plate, a lower rotary plate, and a substrate holding part 2, a treating liquid supplying section 6, a rear surface cleaning section 8, a nitrogen gas valve 38, and a vacuum valve 39. The substrate holding section 2 is provided with a part 10 for suction holding a substrate W. The treating liquid supplying section 6 supplies a photoresist liquid onto the surface of the substrate W held at the holding part 2 in the substrate treating section. The rear side cleaning section 8 cleans the rear side of the upper rotary plate 3. The nitrogen gas valve 38 and the vacuum valve 39 switch the pressures in the substrate holding section 2 and the substrate sucking section 10 alternatively between positive and negative levels.</p> |
