| 摘要 |
PURPOSE:To obtain a nonflammable removing soln. exhibiting excellent-removing action to a photoresist film, especially a degenerated film at low temp., having low corrosiveness and capable of being easily removed only by washing. CONSTITUTION:This removing soln. for a resist consists of org. amines, at least one kind of surfactant selected from among acetylene alcohols represented by the formula (where R<1> is H or lower alkyl and R<2> is H, lower alkyl or lower hydroxyalkyl) and ethylene oxide adducts of them, an aprotic polar solvent and water. |
