| 摘要 |
PURPOSE:To provide a pattern shape deforming method in order to produce a deformed pattern shape in a photolithographic process at a high speed and with high accuracy without needing any troublesome input operation. CONSTITUTION:Two parameters consisting of the pattern shift extent caused in a photolithographic process included in an LSI production process and the curvature radius showing a corner part of a pattern turned into a curve are applied to a calculating part 10 of a computer 1. At the same time, a design pattern 20 is also given to the part 10. Then the part 10 automatically produces a deformed pattern shape from the pattern 20 based on two supplied parameters. |
