发明名称 PRODUCTION OF LIQUID CRYSTAL DISPLAY
摘要 PURPOSE:To enable orientation treatment to be conducted with less generation of dust by linearly scanning and irradiating the surface of the oriented film on the substrate of the liquid crystal display with an ion beam, plasma beam or electron beam linearly through.3 slit. CONSTITUTION:A glass substrate 101 coated with the oriented film 102 consisting of a polyimide film, etc., on a substrate 100. The accelerated beam 105 from a plasma beam source of argon, oxygen, etc., an ion beam source of the argon, oxygen, etc., or an electron beam source, etc., is passed through an aperture 103 provided with the linear slit 104 and made of nickel, silicon, molybdenum or tungsten, etc. The substrate 100 is moved in a moving direction 107 while this oriented film is irradiated with such linear beam 106, by which the entire surface of the oriented film 102 is irradiated with the beam 106. As a result, groovesare formed in a specified direction on the surface of the oriented film 102 and the oreintability is obtd. Then, the orientation treatment to lessen the generation of the dust is possible and the yield is improved.
申请公布号 JPH0756172(A) 申请公布日期 1995.03.03
申请号 JP19930203408 申请日期 1993.08.17
申请人 SEIKO EPSON CORP 发明人 IWAMATSU SEIICHI
分类号 G02F1/1337;(IPC1-7):G02F1/133 主分类号 G02F1/1337
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