发明名称 MANUFACTURE OF THIN FILM PHOTO-CELL DEVICE
摘要 PURPOSE: To obtain an inexpensive photoelectric cell device having high conversion efficiency by cooling a saturated solution containing a semiconductor material in order to deposit a first semiconductor on a substrate, cooling a second saturated solution in order to deposit a second semiconductor on the first semiconductor deposited on the substrate and repeating the steps. CONSTITUTION: A first semiconductor, preferably, silicon is deposited from a metallic solution saturated with a semiconductor material in order to form an absorption layer 14. Tin is preferably employed as a solvent and silicon is deposited on a barrier 12 from a first molten tin. Growth of silicon on the barrier 12 is accelerated by cooling the molten. Similarly, a collector layer 16 is formed on the first semiconductor layer using a second molten of tin and silicon. More specifically, first and second saturated solutions are cooled, a substrate is removed from the growing solution, both saturated solutions are heated for 5-15 min, the solution is supplemented and equilibrium state is reestablished before resuming the growth procedure.
申请公布号 JPH0758354(A) 申请公布日期 1995.03.03
申请号 JP19940197155 申请日期 1994.08.01
申请人 UNIV DELAWARE 发明人 AREN EMU BAANETSUTO
分类号 H01L31/04;H01L21/208;H01L31/052;H01L31/18 主分类号 H01L31/04
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