FORMATION OF SILICON OXIDE FILM AND CVD DEVICE,申请号JP19930217037-传众专利搜索

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发明名称	FORMATION OF SILICON OXIDE FILM AND CVD DEVICE
摘要
申请公布号	JPH0758101(A)	申请公布日期	1995.03.03
申请号	JP19930217037	申请日期	1993.08.09
申请人	HITACHI ELECTRON ENG CO LTD;HITACHI LTD	发明人	ARAI HISAHIRO;SATO EIJI;NAGASAKI KEIICHI;HONMA YOSHIO;SAITO MASAYOSHI;NAKANISHI SHIGEHIKO
分类号	H01L21/205;H01L21/31;H01L21/316;H01L21/36;(IPC1-7):H01L21/316	主分类号	H01L21/205
代理机构		代理人
主权项
地址

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