发明名称 HEAT TREATMENT APPARATUS
摘要 PURPOSE:To alter thermal properties without causing the rise of the cost by providing a cylindrical heat insulating material formed from a plurality of ring-shaped heat insulating pieces stacked vertically, and forming circumferentially an accommodation part between upper and lower adjacent two ring-shaped heat insulating pieces for accomodating a heating resistor. CONSTITUTION:A heating resistor 30 is disposed around a vertical process tube 10, supported by a cylindrical heat insulating member 34. The cylindrical heat insulating member 34 comprises a plurality of ring-shaped heat insulating pieces stacked vertically, and an accommodation part for accommodating the heat resistor 30 is formed circumferentially between the upper and lower adjacent two ring-shaped heat insulating pieces. The accommodation part has an opening in a region opposite to the vertical process tube 10. The number of the ring-shaped insulating pieces stacked and the size thereof are altered and hereby a supporting region for the heating resistor 30 is altered whereby vertical thermal properties are altered. Hereby, in alteration of the temperature distribution lavor of replacing an apparatus itself is eliminated.
申请公布号 JPH0758046(A) 申请公布日期 1995.03.03
申请号 JP19930219050 申请日期 1993.08.11
申请人 TOKYO ELECTRON LTD;TOKYO ELECTRON TOHOKU LTD 发明人 OKASE WATARU
分类号 C21D1/00;F27D11/02;H01L21/205;H01L21/22;H01L21/324;(IPC1-7):H01L21/22 主分类号 C21D1/00
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