APPARATUS AND METHOD FOR POLISHING WAFER,申请号JP19930197589-传众专利搜索

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发明名称	APPARATUS AND METHOD FOR POLISHING WAFER
摘要
申请公布号	JPH0758068(A)	申请公布日期	1995.03.03
申请号	JP19930197589	申请日期	1993.08.10
申请人	FUJITSU LTD;KYUSHU FUJITSU ELECTRON:KK	发明人	SHIMAJIRI MANABU;HASHIGUCHI TOSHIFUMI
分类号	H01L21/304;(IPC1-7):H01L21/304	主分类号	H01L21/304
代理机构		代理人
主权项
地址

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