POSITIVE TYPE ELECTRON BEAM RESIST

摘要

PURPOSE:To provide an electron beam resist having high sensitivity and high resolution and excellent in adhesion and dry etching resistance. CONSTITUTION:This positive type electron beam resist consists of poly(2- cyanoacrylate) and ketone resin. When this resist is used, a resist pattern having high sensitivity and high resolution and excellent in adhesion and dry etching resistance can be formed and a significant effect of enhancing productivity and quality can be produced in the production of a photomask, LSI or superLSI.