Chemical purification for semiconductor processing by partial condensation.

摘要

A purification method and apparatus for creating ultra-purity chemicals for semiconductor processing. The purification method includes a step of expanding an ESG chemical through an orifice (17) inside a condenser (21) to a partial condensed state for removing impurities from ESG chemical. During the expansion step, the higher boiling point impurities remain in the liquid phase and the impurities in the vapor phase are removed at least in part by a scavenging technique. After purification, the ultra-purified gas is transferred to a semiconductor manufacturing operation (24). The manufacturing operation includes both dry and wet processes. The method may also be integrated into a large volume on-site purification system, on-line point of use purifier, or small volume trans-filling purification system.