发明名称 |
Optical arrangement for exposure apparatus |
摘要 |
An optical arrangement includes an optical system for transforming synchrotron radiation light emitted from an emission point of a synchrotron ring into a substantially parallel beam, with respect to a first direction which is parallel to an orbit plane of the synchrotron ring and with respect to a second direction which is perpendicular to the orbit plane, wherein an absolute value of a focal length of the optical system in the first direction is smaller than that in the second direction.
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申请公布号 |
US5394451(A) |
申请公布日期 |
1995.02.28 |
申请号 |
US19920955433 |
申请日期 |
1992.10.02 |
申请人 |
CANON KABUSHIKI KAISHA |
发明人 |
MIYAKE, AKIRA;WATANABE, YUTAKA |
分类号 |
G03F7/20;(IPC1-7):G21K5/04 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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