| 摘要 |
PURPOSE:To obtain the subject new compound useful as a patternforming material component for a negative-positive dual purpose resist because of generating a diamine on ultraviolet light irradiation, and capable of giving a resist excellent in the characteristics balance between light exposure and non-light exposure parts and in resolution. CONSTITUTION:The objective compound of the formula can be obtained, for example, by either of the following processes: bis[[(2-nitro-4,5-dimethoxybenzyl) oxy] carbonyl] chloride is reacted with isophoronediamine in a solvent such as water/dioxane in the presence of a catalyst such as a tertiary amine at 0-60 deg.C for 3-24hr; 3,4-dimethoxy-6-nitrobenzyl alcohol is reacted with isophorone isocyanate in a solvent such as an ether in the presence of a catalyst such as an alkyllithium at 30-100 deg.C for 5-60hr. |
