发明名称 PHOTOSENSITIVE LITHOGRAPHIC PLATE
摘要 PURPOSE:To obtain a photosensitive lithographic plate reducing a residue film in a non-image area after development, preventing a stain at the time of printing, and having both a difficult-to-stain property at the time of printing and a superior property against plate wear. CONSTITUTION:On a surface of a substrate that is grained and anodized, a hydrophilic layer composed of at least one compound selected out of inorganic or organic acid salts of compounds having at least one amino group and group selected out of phosphone group, phosphine group, and phosphate group is provided, or the surface is subjected to another specific surface treatment. After that, a photosensitive layer is provided on the surface of the substrate. In this manner, a photosensitive lithographic plate is produced.
申请公布号 JPH0752575(A) 申请公布日期 1995.02.28
申请号 JP19930222840 申请日期 1993.08.16
申请人 KONICA CORP;MITSUBISHI CHEM CORP 发明人 TONO KATSUHIKO;KOJIMA NORIYOSHI;MATSUBARA SHINICHI;TAKAGI KOJI;HATTORI RYOJI;KOYA YOSHIHIRO;TOMIYASU HIROSHI;TAKADA TERUO
分类号 B41N3/00;G03F7/00;(IPC1-7):B41N3/00 主分类号 B41N3/00
代理机构 代理人
主权项
地址