Photolackzusammensetzung für tiefes UV mit polycyclischem Cyclopentan-2-diazo-1,3-dion.,申请号DE1990615899-传众专利搜索

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发明名称	Photolackzusammensetzung für tiefes UV mit polycyclischem Cyclopentan-2-diazo-1,3-dion.
摘要
申请公布号	DE69015899(D1)	申请公布日期	1995.02.23
申请号	DE1990615899	申请日期	1990.06.28
申请人	HOECHST CELANESE CORP., SOMERVILLE, N.J., US	发明人	WU, CHENGJIU, MORRISTOWN, NEW JERSEY, US;MOORING, ANNE M., WILLIAMSBURG, VIRGINIA 23187, US;YARDLEY, JAMES T., MORRISTOWN, NEW JERSEY, US
分类号	G03F7/004;C07C13/10;C07C245/12;G03F7/016;G03F7/039;H01L21/027;(IPC1-7):G03F7/004	主分类号	G03F7/004
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