发明名称 Apparatus and method for exposing a photosensitive substrate.
摘要 An apparatus for exposing a photosensitive substrate 18 has an exposure head 24 mounted on a X-Y positioner. The head is provided with two laser beams 30 and 32. The beam 30 presensitizes selected regions of the photosensitive substrate and impinges on the regions prior to or simultaneously with impingement thereon by beam 32, which constitutes a writing laser beam. The apparatus has the shape of a flatbed printing plate exposure device.
申请公布号 EP0639799(A1) 申请公布日期 1995.02.22
申请号 EP19940111961 申请日期 1994.08.01
申请人 SCITEX CORPORATION LTD. 发明人 ZERTANI, RUDOLF, DR.;BRONSTEIN, RAFAIL
分类号 G03F7/20;H05K3/00 主分类号 G03F7/20
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