发明名称 In place gas cleaning of diffusion elements.
摘要 <p>The cleaning of multi-pore diffusion elements (490), while being submerged in a liquid medium, by the intermittent or continuous passage of a cleaning gas therethrough, either alone or in admixture with the treatment gas (480). The frequency or amount of cleaning gas is such as to prevent fouling of the elements (490), and determined with reference to the dynamic wet pressure of the elements (490) or the mean bubble release pressure relative to their base condition. The maximum permitted pressure level is 25 inches of water gauge above the base condition, the dynamic wet pressure being determined at 2 SCFM per square foot of active gas discharge surface. The cleaning gas coming from the cleaning gas system (500) is fed to the elements (490) through a network including a plurality of distribution pipes (489) to which the elements (490) are connected normally at or adjacent the base (471) of a treatment tank (470).</p>
申请公布号 EP0049154(B2) 申请公布日期 1995.02.15
申请号 EP19810304493 申请日期 1981.09.29
申请人 WATER POLLUTION CONTROL CORPORATION 发明人 SCHMIT, FRANK L.;REDMON, DAVID T.;EWING, LLOYD
分类号 B01F3/04;B01F15/00;C02F3/20;(IPC1-7):C02F3/20;B08B5/00 主分类号 B01F3/04
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