发明名称
摘要 PURPOSE:To remove selectively a light transmittable conductive film and sublimatable insulator and to form channels of openings by forming said conductive film and insulator on a thin org. resin film and irradiating pulse laser light thereto. CONSTITUTION:A light transmittable conductive film 2 consisting principally of indium oxide or tin oxide is formed by a sputtering method on a thin org. resin film 1 having an insulating surface and 180 deg.C upper limit templ for continuous use. SiO which is a sublimatable insulator 22 is vacuum-evaporated atop said film by a diagonal vapor deposition method, a vapor deposition method using an electron beam or a tantalumn crucible for SiO. If a YAG laser is repeatedly and simultaneously irradiated at 6kHz, 1.3W average output, 100nsec-1musec pulse width and 60cm/min scanning speed, channels 10, 10'' are obtd. The two films 2, 22, have approximately the same shape and no damage and partial deterioation are generated at all on the surface of the resin 1.
申请公布号 JPH0713954(B2) 申请公布日期 1995.02.15
申请号 JP19830208652 申请日期 1983.11.07
申请人 发明人
分类号 B26F3/16;B23K26/00;B23K26/18;B23K26/38;B23K26/40;B29C63/48;G02F1/13;H01L21/302 主分类号 B26F3/16
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