摘要 |
A resist composition comprising a compound having an active hydrogen and an alkali-soluble siloxane polymer containing in the molecules thereof at least one unit selected from a unit represented by formula (I) and a unit represented by formula (II) e the same or different and each represents one member selected from the group consisting of hydrogen, <IMAGE> (where R represents hydrogen, a hydrocarbon group, or a substituted hydrocarbon group); and a carboxyl group; R1, R2, R3, R4, R5, and R6 are the same or different and each represents one member selected from the group consisting of hydrogen, a hydroxyl group, a substituted or unsubstituted aliphatic hydrocarbon group, and a substituted or unsubstituted aromatic hydrocarbon group, provided that at least one of R1 to R6 is a hydroxyl group; and l, m, n, and p each is 0 or a positive integer, provided that l and m are not 0 at the same time.
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申请人 |
FUJI PHOTO FILM CO., LTD.;NIPPON TELEGRAPH AND TELEPHONE CORPORATION |
发明人 |
KOKUBO, TADAYOSHI;SAKAMOTO, ATSUSHI;TANAKA, AKINOBU;BAN, HIROSHI |