发明名称 Resist composition comprising a siloxane or silsesquioxane polymer having silanol groups in a composition with a naphthoquinone compound
摘要 A resist composition comprising a compound having an active hydrogen and an alkali-soluble siloxane polymer containing in the molecules thereof at least one unit selected from a unit represented by formula (I) and a unit represented by formula (II) e the same or different and each represents one member selected from the group consisting of hydrogen, <IMAGE> (where R represents hydrogen, a hydrocarbon group, or a substituted hydrocarbon group); and a carboxyl group; R1, R2, R3, R4, R5, and R6 are the same or different and each represents one member selected from the group consisting of hydrogen, a hydroxyl group, a substituted or unsubstituted aliphatic hydrocarbon group, and a substituted or unsubstituted aromatic hydrocarbon group, provided that at least one of R1 to R6 is a hydroxyl group; and l, m, n, and p each is 0 or a positive integer, provided that l and m are not 0 at the same time.
申请公布号 US5389492(A) 申请公布日期 1995.02.14
申请号 US19940225088 申请日期 1994.04.08
申请人 FUJI PHOTO FILM CO., LTD.;NIPPON TELEGRAPH AND TELEPHONE CORPORATION 发明人 KOKUBO, TADAYOSHI;SAKAMOTO, ATSUSHI;TANAKA, AKINOBU;BAN, HIROSHI
分类号 G03F7/075;C08G77/14;C08G77/38;G03F7/004;G03F7/022;H01B3/00;H01L21/027;H01L21/30;(IPC1-7):G03F7/023;G03F7/30 主分类号 G03F7/075
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