发明名称 |
RADIATION SENSITIVE MATERIALS AND DEVICES MADE THEREWITH |
摘要 |
Sensitive deep ultraviolet resists are formed utilizing a material that undergoes decomposition to form an acid together with a polymer including a chain scission inducing monomer such as sulfonyl units and substituent that undergoes reaction to form an acidic moiety when subjected to the photogenerated species. An exemplary composition includes poly(t-butoxycarbonyloxystyrene-sulfone) and 2,6-dinitrobenzyl-p-toluene sulfonate. The sulfonate decomposes to form sulfonic acid upon irradiation. This acid reacts with the polymer group to form an acid functionality while the sulfone moiety of the polymer induces scission. As a result, the irradiated portions of the resist material are soluble in ionic solvents while the unirradiated portions are not.
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申请公布号 |
CA1334351(C) |
申请公布日期 |
1995.02.14 |
申请号 |
CA19890591764 |
申请日期 |
1989.02.22 |
申请人 |
AMERICAN TELEPHONE AND TELEGRAPH COMPANY |
发明人 |
HOULIHAN, FRANCIS M.;REICHMANIS, ELSA;THOMPSON, LARRY F. |
分类号 |
G03F7/004;G03F7/038;G03F7/039;H01L21/027;H01L21/30;(IPC1-7):G03F7/039 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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