| 发明名称 |
Negative working resist composition |
| 摘要 |
A negative working resist composition comprising (a) an alkali-soluble resin, (b) an aromatic compound having at least two groups of the formula: -OCH2OR1 wherein R1 is alkyl or aralkyl, (c) a photoacid generator, and (d) a solvent, can form fine patterns with high resolution when exposed to deep UV, KrF excimer laser light, etc. due to high light transmittance and high sensitivity.
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| 申请公布号 |
US5389491(A) |
申请公布日期 |
1995.02.14 |
| 申请号 |
US19930082399 |
申请日期 |
1993.06.28 |
| 申请人 |
MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.;WAKO PURE CHEMICAL INDUSTRIES, LTD. |
发明人 |
TANI, YOSHIYUKI;ENDO, MASAYUKI;URANO, FUMIYOSHI;YASUDA, TAKANORI |
| 分类号 |
G03F7/004;G03F7/038;(IPC1-7):G03F7/012;G03F7/021;G03F7/023 |
主分类号 |
G03F7/004 |
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