发明名称 |
Method of and apparatus for stabilizing shapes of objects, such as optical elements, as well as exposure apparatus using same and method of manufacturing semiconductor devices |
摘要 |
A temperature distribution of an object, such as an optical element, onto which radiation energy is irradiated, is measured. The change of the shape of the object is controlled by varying the temperature of a part of the object on the basis of the measured temperature distribution to stabilize the shape of the object. Also, the shape of the object being irradiated is stabilized by causing the same temperature distribution in the object when in the thermally stable condition to be generated in the object while it is being irradiated. If the shapes of masks used to manufacture semiconductor devices are stabilized by using the above methods, highly integrated semiconductor devices can be manufactured.
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申请公布号 |
US5390228(A) |
申请公布日期 |
1995.02.14 |
申请号 |
US19940270794 |
申请日期 |
1994.07.05 |
申请人 |
CANON KABUSHIKI KAISHA |
发明人 |
NIIBE, MASAHITO;FUKUDA, YASUAKI;HAYASHIDA, MASAMI |
分类号 |
G03F7/20;(IPC1-7):G21K5/02 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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