发明名称 Thin film capacitors
摘要 The invention relates to a method for forming a high capacitance thin film capacitor comprising forming an amorphous layer of a dielectric material on the surface of a polycrystalline layer of said dielectric material and arranging the resulting double layer between upper and lower electrodes. The invention further comprises dielectric articles such as capacitors formed in accordance with the method of the invention and includes their use in an electronic circuit.
申请公布号 US5390072(A) 申请公布日期 1995.02.14
申请号 US19920945891 申请日期 1992.09.17
申请人 RESEARCH FOUNDATION OF STATE UNIVERSITY OF NEW YORK 发明人 ANDERSON, WAYNE A.;HAMILTON, ROBERT S.;JIA, QUANXI;SHI, ZHIQING
分类号 H01G4/20;H01L21/02;(IPC1-7):H01G4/10 主分类号 H01G4/20
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