Method and device for exposure using ultraviolet light

摘要

The invention relates to photolithography. In an apparatus for exposure using ultraviolet light, substances contained in an atmosphere which comes into contact with a surface of lenses (L1-L10) are reduced and they produce deposits on the lens surface. Openings (H1-H9) are formed in the wall of a lens frame (1) in order to make it possible to replace the atmosphere by a suitable gas. The suitable gas may be a gas which contains no oxygen, such as nitrogen or purified air obtained by intentionally producing deposits by application of ultraviolet light to air. Application to the fabrication of integrated circuits.