| 摘要 |
<p>PURPOSE:To precisely control the size and the shape of beam section, by controlling and determining the relative position of two blinds wherein the exposure region of a substrate to be exposed is contained in a beam forming member, and a space filter is built in. CONSTITUTION:This laser lithography equipment consists of a light source 100, converging optical systems 101 and 102, a beam forming member 10A, projection optical systems 104 and 105, retainers 106 and 107 for holding a substrate to be exposed. A laser beam outputted from a laser oscillator 100 is expanded by a concave lens 101, and made a parallel beam by a convex lens 102, and the transmission region is limited by the beam forming member 10A. A mask blank 106 is irradiated with the beam via projection lenses 104 and 105. The beam forming member 10A contains two blinds 11a, 11b, and the the relative position is changed by moving the blinds in the arrow direction. The control is performed, e.g. by using a pulse motor. A main aperture part 11e surrounded by the two blinds 11a, 11b is the transmission region of the laser beam.</p> |
