发明名称 METHOD OF STACKING UPPER LAYER THIN FILM OVER OXIDE SUPERCONDUCTING THIN FILM
摘要 PURPOSE:To form a thin film of good crystallinity through formation of a good interface by making the substrate temperature in forming a non- superconducting film and insulator film under the maximum temperature not adversely affecting mutual diffusion and over the minimum temperature by which the crystalline thin film grows. CONSTITUTION:In stacking an SrTiO3 thin film over a Y1Ba2Cu3O7-x oxide superconducting thin film, film-forming is made at a substrate temperature lower than a temperature by which mutual diffusion occurs in an interface. Also, an Au thin film which is to be further stacked over this SrTiO3 thin film is formed at a substrate temperature by which a mutual diffusion does not occur between the Y1Ba2Cu3O7-x oxide film and the SrTiO3 thin film. Consequently, very little mutual diffusion in the interface occurs, thus forming a sharp interface.
申请公布号 JPH0738164(A) 申请公布日期 1995.02.07
申请号 JP19930200016 申请日期 1993.07.19
申请人 SUMITOMO ELECTRIC IND LTD 发明人 TANAKA SATOSHI;IIYAMA MICHITOMO
分类号 C01G1/00;C01G3/00;C30B29/22;H01B12/06;H01B13/00;H01L39/22;H01L39/24;(IPC1-7):H01L39/24 主分类号 C01G1/00
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