发明名称 Method for making a fillet for integrated circuit metal plug
摘要 A well in a semiconductor wafer is partially filled by a tungsten plug having an irregular surface. There is an aluminum line exterior of the well for electrically connecting the tungsten plug into an electrical circuit. A doped polysilicon fillet having an irregular surface meshing with the irregular surface of the tungsten plug fills the portion of the well between the plug and line, making a reproducible good electrical connection between the tungsten plug and the aluminum line. The poly fillet is formed by a poly deposit and planarization performed between a tungsten plug overetch and aluminum line deposition.
申请公布号 US5387550(A) 申请公布日期 1995.02.07
申请号 US19920832349 申请日期 1992.02.07
申请人 MICRON TECHNOLOGY, INC. 发明人 CHEFFINGS, DAVID F.;ROBERTS, MARTIN C.
分类号 H01L21/768;(IPC1-7):H01L21/44;H01L21/48 主分类号 H01L21/768
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