| 摘要 |
<p>PURPOSE:To further simplify the dividing method of an exposure pattern by a method wherein the exposure pattern is divided according to the parameters representing the size of an exposure substrate, that of a mask and the maximum mobility of a stage on a vertical surface to the optic axis of exposure light. CONSTITUTION:Plural kinds of unit patterns PM obtained by dividing the exposure pattern PA to be exposure-transferred onto an exposure substrate P are formed on a single or plural masks M. Next, unit patterns PM formed on the mask M are exposed and connected to the exposure substrate P mounted on a stage 5 through the intermediary of a projection lens 4. At this time, the exposure pattern PA is divided according to the parameters DX, DY, MX, MY and the others representing the size of the exposure substrate P, that of a mask M and the maximum mobility of the stage 5. Through these procedures, the pertinent dividing method can be made further simply.</p> |
