| 摘要 |
PURPOSE:To enable the formation of isolated lines simply by executing an ordinary photoresist treatment by providing the mask with tapered parts where phases are not inverted. CONSTITUTION:SOG(Spin On Glass) at the points where the isolated lines 7 are formed sharply forms edges 5 to invert the phases but the points where the isolated lines are not formed are conversely gently tapered so as not to stress the edges. The SOG is otherwise previously applied over the entire surface of the mask and grooves are formed at the points to be formed with the isolated lines to invert the phases. The phases are not inverted in the SOG formed with the tapered parts 4 and having the gentle slopes and, therefore, the edges are not stressed and since resist patterns are not formed, the isolated lines 7 having the sharp edges 5 are formed only along the end faces of the SOG. The similar isolated lines 7 are formed in the case the SOG layer is provided with groove parts by grooving this layer. Then, the isolated lines 7 are formed only along the end faces of the light shielding film and a need for executing exposure twice is eliminated. |
