| 摘要 |
PURPOSE:To provide a manufacturing method of an organic thin film wherein smoothness of an upper layer is not lost even if the film is formed to a multilayer by removing a rising part formed in a circumferencial edge of the organic thin film during an organic thin film formation. CONSTITUTION:Photosensitive polyimide (negative type) is applied onto an alumina substrate 1 with smoothness. Optical irradiation is carried out through a photomask, and a part which is not exposed to light is treated by developer. Thereby, a polyimide film 2a whose rising part of a substrate circumferential edge is removed is formed. Photosensitive polyimide (negative type) is applied again to an upper layer thereof and exposed to light repeatedly to form four layers of polyimide films 2a, 2b, 2c, 2d. Since the rising part of a first layer of the polyimide layer is removed, a film can be formed without losing smoothness of a film of an upper layer even if a four-layer film is formed of the same organic high polymer material. |
