| 摘要 |
<p>PURPOSE:To provide a vertical wafer holder which holds wafers treated in a vertical furnace and which facilitates suppression of the production of particles and elimination of the contamination of the wafers caused by the particles. CONSTITUTION:A whole vertical wafer holder 20 which holds wafers 12 and is placed in a vertical furnace has an open structure and a heat insulating plate 14 is provided in the required range of the lower part of the vertical wafer holder 20. With this constitution, gas charge after a wafer treatment is performed perfectly and residual reactant gas which produces particles is eliminated.</p> |
