Method of fabrication of PNP structure in a common substrate containing NPN or MOS structures

摘要

A pnp device in a BiCMOS structure (1). PNP transistors (4) are fabricated without the need for additional process steps on the same substrate as npn (2), PMOS (8), and NMOS (6) devices. The process not only requires a minimum number of additional process steps, but results in devices with near optimum device characteristics.