发明名称 |
PRODUCTION OF QUARTZ GLASS FILM |
摘要 |
PURPOSE:To produce a high quality quartz glass film by a sol-gel processing method. CONSTITUTION:Metal alkoxides including silicon alkoxide as the principal component are hydrolyzed, a sol is prepd. by a polycondensation reaction which takes place simultaneously with the hydrolysis and an optical waveguide with a quartz glass film produced from the sol is produced. At this time, the sol is kept at 30-100 deg.C and cured for a time corresponding to 20-80% of the gelling time of the sol at, the temp., the top of a substrate is coated with the cured sol and this sol is dried and heated to produce the objective silica-based glass film on the top of the substrate. |
申请公布号 |
JPH0735937(A) |
申请公布日期 |
1995.02.07 |
申请号 |
JP19930181492 |
申请日期 |
1993.07.22 |
申请人 |
SUMITOMO ELECTRIC IND LTD |
发明人 |
HOSHINO SUMIO;ITO MASUMI;CHIGUSA YOSHIKI |
分类号 |
C03C17/23;C03B8/02;C03B19/12;C03B20/00;C03C1/00;G02B6/13;(IPC1-7):G02B6/13 |
主分类号 |
C03C17/23 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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