发明名称 PHOTOSENSITIVE RESIN COMPOSITION
摘要 PURPOSE:To provide an aq. emulsion type photosensitive resin compsn. excellent in water resistance, solvent, resistance and sensitivity. CONSTITUTION:This photosensitive resin compsn. contains an aq. emulsion of internally crosslinked acrylic resin obtd. by emulsion-polymerizing an acrylic monomer and a monomer having two or more polymerizable unsatd. groups in the presence of a photosensitive saponified vinyl acetate polymer having constituent units represented by the general formula, wherein R<1> is a quaternized arom. nitrogen-contg. heterocyclic residue, R<2> is H or lower alkoxy, (m) is 0 or 1 and (n) is an integer of 1-6.
申请公布号 JPH0736186(A) 申请公布日期 1995.02.07
申请号 JP19930183620 申请日期 1993.07.26
申请人 TOYO GOSEI KOGYO KK;TAISEI KAYAKU KK 发明人 TOCHISAWA TETSUAKI;SHIBUYA TORU;KUNIYOSHI YASUO;KIKUCHI HIDEO;ICHIMURA KUNIHIRO;ONISHI KAZUMASA;OHARA MASARU
分类号 G03F7/033;G03F7/038;G03F7/12;(IPC1-7):G03F7/033 主分类号 G03F7/033
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