发明名称 |
PHOTOSENSITIVE RESIN COMPOSITION |
摘要 |
PURPOSE:To provide an aq. emulsion type photosensitive resin compsn. excellent in water resistance, solvent, resistance and sensitivity. CONSTITUTION:This photosensitive resin compsn. contains an aq. emulsion of internally crosslinked acrylic resin obtd. by emulsion-polymerizing an acrylic monomer and a monomer having two or more polymerizable unsatd. groups in the presence of a photosensitive saponified vinyl acetate polymer having constituent units represented by the general formula, wherein R<1> is a quaternized arom. nitrogen-contg. heterocyclic residue, R<2> is H or lower alkoxy, (m) is 0 or 1 and (n) is an integer of 1-6. |
申请公布号 |
JPH0736186(A) |
申请公布日期 |
1995.02.07 |
申请号 |
JP19930183620 |
申请日期 |
1993.07.26 |
申请人 |
TOYO GOSEI KOGYO KK;TAISEI KAYAKU KK |
发明人 |
TOCHISAWA TETSUAKI;SHIBUYA TORU;KUNIYOSHI YASUO;KIKUCHI HIDEO;ICHIMURA KUNIHIRO;ONISHI KAZUMASA;OHARA MASARU |
分类号 |
G03F7/033;G03F7/038;G03F7/12;(IPC1-7):G03F7/033 |
主分类号 |
G03F7/033 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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