发明名称 Method of making a semiconductor device including carbon as a dopant
摘要 While producing a III-V compound semiconductor layer, carbon is added to group III and V elements to control the p type conductivity of the semiconductor layer, forming a p type region. Then, a small amount of n type dopant is added to the group III and V elements together with the carbon to control the n type conductivity of the semiconductor layer, forming an n type region. Therefore, a sharp and precisely-controlled doping profile is obtained in the vicinity of the p-n junction, resulting in a semiconductor device having high initial-performance and high reliability.
申请公布号 US5387544(A) 申请公布日期 1995.02.07
申请号 US19940216022 申请日期 1994.03.21
申请人 MITSUBISHI DENKI KABUSHIKI KAISHA 发明人 HAYAFUJI, NORIO
分类号 H01L21/205;H01L21/331;H01L29/205;H01L29/73;H01L29/737;H01S5/00;(IPC1-7):H01R21/22 主分类号 H01L21/205
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