| 摘要 |
PURPOSE:To form ferroelectric thin film high in polarizability in which polarization is uniform in one direction, at the time of forming a ferroelectric thin film on a substrate, by impressing voltage on the space between a target and the substrate in the process of the film forming and/or after the film forming. CONSTITUTION:At the time of irradiating a target with an ultraviolet laser 3 to form a film on a substrate 4 (such as a single crystal substrate) in a vacuum chamber, a ring electrode 10 is used and an electric field gradient is given in the vertical direction of the substrate 4. Furthermore, a voltage impressed on the ring electrode 10 is different according to the distance between the substrate 4 and the electrode 10, the voltage is preferably regulated to the range of about 1000 to 3000V/cm. In this way, the ferroelectric thin film of single polarization is formed on the substrate 4. |
