Magnetron sputter ion plating,申请号HK19950000103-传众专利搜索

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发明名称	Magnetron sputter ion plating
摘要
申请公布号	HK10395(A)	申请公布日期	1995.02.03
申请号	HK19950000103	申请日期	1995.01.26
申请人	TEER COATINGS LIMITED	发明人	TEER DENNIS GERALD
分类号	C23C14/22;C23C14/32;C23C14/35;H01J37/32;(IPC1-7):H01J37/34	主分类号	C23C14/22
代理机构		代理人
主权项
地址

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