发明名称 Method and device for surface polishing
摘要 A washing liquid and a granulated material in a quantity equivalent to or greater than the specific weight of the liquid are accommodated in a drum in such a way that the surface of the liquid lies above the top side of the layer of granulated material when the drum is stationary, and the drum is swung back and forth with an article to be washed accommodated in the drum so that spots adhering to the article can be washed off it. In the same way, various treatment liquids such as, for example, a plating liquid and a granulated material which is electrically conductive or non-conductive can be accommodated in the drum together with an article to be treated. By swinging of the drum, the treatment liquid and the granulated material are agitated in the drum and flow in such a way that the fluidity of the treatment liquid and of the granulated material is improved relative to the article to be treated, as a result of which the treatment efficiency and the uniformity of the operation is improved. Thus surface treatment can be carried out with high productivity and high quality. All types of surface polishing can be effectively carried out. <IMAGE>
申请公布号 DE4325472(A1) 申请公布日期 1995.02.02
申请号 DE19934325472 申请日期 1993.07.29
申请人 TSUTSUMI, KATSUJI, UJI, KYOTO, JP 发明人 TSUTSUMI, KATSUJI, UJI, KYOTO, JP
分类号 B23H5/00;A47L15/04;B23H5/06;B24B31/00;B24B31/06;C25F3/00;C25F3/16;C25F7/00;(IPC1-7):B08B7/04;B08B3/06;B08B3/10;B08B3/04;B24B1/04;C09G1/02;C11D3/38;C09K3/14;C25D17/18;C23F1/00 主分类号 B23H5/00
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