发明名称 EXPOSURE UNIT AND METHOD FOR EXPOSING PHOTOSENSITIVE MATERIALS
摘要 <p>An exposure unit and method for imaging a photosensitive material includes a source of radiation for exposing the photosensitive material to actinic radiation such that the radiation strikes the photosensitive material at a plurality of angles of incidence, and apparatus for moving the radiation source relative to and in a plane parallel to the photosensitive material. The exposure unit also has a reflector for controlling (1) the proportion of (a) radiation having perpendicular angles of incidence to (b) radiation having non-perpendicular angles of incidence, such that the radiation having non-perpendicular angles is increased, and (2) the distribution of non-perpendicular angles of incidence.</p>
申请公布号 WO1995003564(A1) 申请公布日期 1995.02.02
申请号 US1994008369 申请日期 1994.07.25
申请人 发明人
分类号 主分类号
代理机构 代理人
主权项
地址