| 发明名称 |
Nitrogen trifluoride thermal cleaning apparatus and process. |
| 摘要 |
The present invention is a method and apparatus for the dynamic cleaning of semiconductor fabrication equipment and particularly quartzware with thermally activated nitrogen trifluoride wherein the cleaning effluent is safely removed and cleaning by-products isolated or diluted to provide for efficient cleaning and rapid restarts of fabrication equipment so cleaned. <IMAGE> |
| 申请公布号 |
EP0636707(A2) |
申请公布日期 |
1995.02.01 |
| 申请号 |
EP19940111234 |
申请日期 |
1994.07.19 |
| 申请人 |
AIR PRODUCTS AND CHEMICALS, INC.;GEC, INC. |
发明人 |
HULING, BRUCE ALAN;SCHNEIDER, CHARLES ANTHONY;ENGLE, GEORGE MARTIN |
| 分类号 |
B08B3/08;B08B7/00;C11D7/02;C23C16/44;H01L21/02;H01L21/302;H01L21/304;H01L21/3065 |
主分类号 |
B08B3/08 |
| 代理机构 |
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代理人 |
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| 主权项 |
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