Photoinitiator compositions and photosensitive materials using the same.

摘要

A photoinitiator composition (A) comprising an N-aryl- alpha -amino acid (I'), a 3-substituted coumarin (II) and an azabenzalcyclohexanone (III), or a photoinitiator composition (B) comprising an N-aryl- alpha -amino acid (I'), a 3-substituted coumarin (II) and a titanocene (IV), or a photoinitiator composition (C) comprising a 3-substituted coumarin (II), a titanocene (IV) and an oxime ester (V), is effective for improving photosensitive properties of photosensitive materials containing poly(amic acid) and an addition polymerizable compound used for pattern formation. There are also provided novel N-aryl- alpha -amino acids of formula (I).