HALFTONE PHASE-SHIFT PHOTOMASK AND BLANK FOR THE SAME

摘要

PURPOSE:To obtain a halftone phase-shift photomask of simple structure by which a plate making process is shortened, cost is reduced and yield is increased and with the existing production line used as such and to obtain a blank for the photomask. CONSTITUTION:A halftone phase-shift layer 806 on a transparent substrate 803 contains at least one layer consisting essentially of a chromium compd. to constitute a halftone phase-shift photomask 809. In the photomask, the compositional ratio of the chromium atom to oxygen atom in the layer consisting essentially of a chromium compd. is found to be 100:(100 to 300) by X-ray photoelectron spectroscopy for chemical analysis.