| 摘要 |
PURPOSE:To provide the manufacturing method of a CdS sintered film whose optical transmissivity is higher than that in conventional cases by reducing a grain boundary and a pore which exist locally as the optical reflection loss of the CdS sintered film formed in such a way that a glass substrate is coated with a paste prepared by adding a CdCl2 powder and a caking agent to a CdS powder in an average particle size of 2 to 3mum and that the paste is sintered. CONSTITUTION:In a compound semiconductor powder A1 which contains CdS or Cd and S in different particle sizes and a fine powder B3 (particle size: A1>B3), the power A1 in a average particle size of 2 to 3mum is coated with the fine powder B3 in an average particle size of 0.1 to 1mum and with a CdCl2 powder 2, or the powder A1 is coated with only the CdCl2 powder, a caking agent is added to the powder, a paste is prepared, a glass substrate is coated with the paste, and the paste is sintered. Thereby, a CdS sintered film is manufactured. |
