PHOTOSENSITIVE RESIN COMPOSITION AND PRODUCTION OF PHOTOSENSITIVE ELEMENT AND RESIST PATTERN USING THE SAME

摘要

PURPOSE:To provide a photosensitive resin compsn. ensuring both improved adhesion to a metal and improved strength of a tinting film. CONSTITUTION:This photosensitive resin compsn. contains a graft polymer having acid value of 20-300 obtd. by copolymerizing acrylic acid and/or methacrylic acid and a macromonomer having one polymerizable unsatd. group at one terminal of polystyrene or a polystyrene copolymer as essential components, a monomer having two or more photopolymerizable unsatd. groups in each molecule and a photopolymn. initiator. A photosensitive element and a resist pattern are produced using this photosensitive resin compsn.