| 摘要 |
PURPOSE: To obtain a process for producing carbon substrates for magnetic disks which is low in treatment speeds and low in a manufacturing cost and is capable of decreasing the variations of surface roughness within the planes of the respective substrates and the variations in the surface roughness between the respective substrates within a lot. CONSTITUTION: The surfaces of the carbon substrates are roughened by dry etching. The surface roughness Ra of the carbon substrates is regulated to 10 to 500Å by this dry etching. The more concrete method of the dry etching includes, for example, chemical dry etching, barrel etching, plasma etching, RIE, RIBE or ion milling. |
